Implanted argon atoms as sensing probes of residual stress in ultrathin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.126630
Reference12 articles.
1. Void Nucleation in Passivated Interconnect Lines: Effects of Site Geometries, Interfaces, and Interface Flaws
2. Electromigration and stress-induced voiding in fine Al and Al-alloy thin-film lines
3. Strain-induced perpendicular magnetic anisotropy in ultrathin Ni films on Cu3Au(0 0 1)
4. Strain-induced large low-field magnetoresistance in Pr0.67Sr0.33MnO3 ultrathin films
5. First-principles theory of magnetoelastic coupling and magnetic anisotropy strain dependence in ultrathin Co films on Cu(001)
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