Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm-Reference-Cited by-同舟云学术

Rare-earth plasma extreme ultraviolet sources at 6.5–6.7 nm

Published:2010-09-13 Issue:11 Volume:97 Page:111503
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Otsuka Takamitsu,Kilbane Deirdre,White John,Higashiguchi Takeshi,Yugami Noboru,Yatagai Toyohiko,Jiang Weihua,Endo Akira,Dunne Padraig,O’Sullivan Gerry

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3490704

Reference21 articles.

1. Fraunhoffer IOF Annual Report, 2007 (unpublished).

2. EUV Sources for Lithography

3. Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

4. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime

Cited by 83 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral control of beyond extreme ultraviolet emission from a dual-laser-produced plasma;Applied Physics Letters;2024-01-29

2. Angular distribution separation of the extreme ultraviolet emission and suprathermal ions with energy reduction;Applied Physics Letters;2024-01-29

3. Measurements of the Absolute Values of the Radiation Intensity in the Wavelength Range of 6.6–32 nm of Stainless Steel Targets with Pulsed Laser Excitation;Technical Physics;2024-01

4. Prospective Wavelengths for Projection Lithography Using Synchrotron Radiation;Technical Physics;2024-01

5. On the Prospects of Lithography in the Region of Wavelengths Shorter than 13.5 nm;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-12