Guidelines for attaining optimal soft magnetic properties in FeAlSi films

Author:

Akamatsu Shoma1ORCID,Oogane Mikihiko123,Tsunoda Masakiyo34,Ando Yasuo123

Affiliation:

1. Department of Applied Physics, Graduate School of Engineering, Tohoku University, Sendai, 980-8579, Japan

2. Center for Science and Innovation in Spintronics (Core Research Cluster), Organization for Advanced Studies, Tohoku University, Sendai 980-8577, Japan

3. Center for Spintronics Research Network, Tohoku University, Sendai 980-8577, Japan

4. Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan

Abstract

Nm-order FeAlSi epitaxial films with a partially D03-ordered structure were grown on MgO substrates, and ideal soft magnetic properties were obtained. We found that the sign of the magnetocrystalline anisotropy constant K1 changes with increasing annealing temperature for certain FeAlSi compositions. This is caused by a change in the volume balance of the ordered phases with the annealing process and the point at which K1 ∼ 0 shifts to the Al-rich concentration as the degree of D03-ordering decreases. K1 was precisely measured by ferromagnetic resonance under the optimal condition, and the value of 1.6 × 102 (erg/cc) was obtained, which is comparable to that of bulk. The uniaxial component of the magnetic anisotropy due to magnetostriction was small, and a fourfold symmetric component due to magnetocrystalline anisotropy was dominant.

Funder

Japan Society for the Promotion of Science

Japan Science and Technology Agency

Center for Spintronics Research Network, Tohoku University

Tohoku University

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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