Tunnel anisotropic magnetoresistance in magnetic tunnel junctions using FeAlSi

Author:

Akamatsu S.1ORCID,Nakano T.1ORCID,Al-Mahdawi Muftah2ORCID,Yupeng W.1,Tsunoda M.3ORCID,Ando Y.12,Oogane M.12ORCID

Affiliation:

1. Department of Applied Physics, Graduate School of Engineering, Tohoku University 1 , Sendai 980-8579, Japan

2. Center for Science and Innovation in Spintronics (Core Research Cluster) Organization for Advanced Studies, Tohoku University 2 , Sendai 980-8577, Japan

3. Department of Electronic Engineering, Graduate School of Engineering, Tohoku University 3 , Sendai 980-8579, Japan

Abstract

We fabricated magnetic tunnel junctions (MTJs) with FeAlSi free layers and investigated the tunnel magnetoresistance (TMR) properties at low temperature. We observed TMR ratio increase with temperature decrease, and confirmed the TMR ratio of 179.9% at 10 K. The conductance dependence on bias voltage was measured, and a clear peak at low bias voltage similar to Fe/MgO/Fe MTJs was observed. This behavior can be explained by considering the majority band of Fe(001), and Δ5 electrons tunneling in FeAlSi/MgO/CoFeB MTJs at low bias voltage. We also investigated tunnel anisotropic magneto-resistance (TAMR) and clearly observed a TAMR peak similar to Fe/MgO/Fe MTJs, where the TAMR ratio of FeAlSi/MgO/CoFeB MTJs was 1.0% comparable to 1.1% in Fe/MgO/Fe MTJs. We concluded that electron tunneling was caused by the interfacial resonance states originating from spin orbit coupling in the FeAlSi/MgO/CoFeB MTJs.

Funder

Japan Society for the Promotion of Science London

Japan Science and Technology Agency

New Energy and Industrial Technology Development Organization

Tohoku University

Publisher

AIP Publishing

Subject

General Physics and Astronomy

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