Crystalline quality improvement of silicon on sapphire film by oxygen implantation and subsequent thermal annealing

Author:

Yamamoto Y.,Sugiyama T.,Hara A.,Inada T.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Application of ion implantation for the modification of silicon-on-sapphire epitaxial systems, their structure, and properties;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2017-07

2. Structurally perfect silicon layers produced on sapphire by oxygen ion implantation;Inorganic Materials;2011-05-25

3. Crystallinity improvement of epitaxial CeO2 films by high-energy ion irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-05

4. Rare Earth Thermoelectrics;MRS Proceedings;1997

5. Methods of Forming SOI Wafers;Electrical Characterization of Silicon-on-Insulator Materials and Devices;1995

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