Experimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3599618
Reference10 articles.
1. Electrical and optical properties of amorphous Si:F:H alloys
2. rf glow discharge of SiF4‐H2mixtures: Diagnostics and modeling of thea‐Si plasma deposition process
3. Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma
4. Diamond films grown by millimeter wave plasma-assisted CVD reactor
5. Structural and electrical properties of low temperature polycrystalline silicon deposited using SiF4SiH4H2
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