rf glow discharge of SiF4‐H2mixtures: Diagnostics and modeling of thea‐Si plasma deposition process
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347623
Reference35 articles.
1. Substitutional doping in amorphous semiconductors the As-Si system
2. Mass spectrometry of a silane glow discharge during plasma deposition of a-Si: H films
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4. Electrical and optical properties of amorphous Si:F:H alloys
5. The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys
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