Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF<sub>4</sub>/Ar/H<sub>2</sub> Glow Discharge Plasma-Reference-Cited by-同舟云学术

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Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF₄/Ar/H₂ Glow Discharge Plasma

Published:2001-11 Issue: Volume:80-81 Page:237-242
ISSN:1662-9779
Container-title:Solid State Phenomena
language:
Short-container-title:SSP

Author:

Kumar Satyendra¹,Brenot R.¹,Kalache Billel¹,Tripathi V.¹,Vanderhaghen R.¹,Drevillon B.¹,Roca i Cabarrocas Pere¹

Affiliation:

1. Ecole Polytechnique

Publisher

Trans Tech Publications, Ltd.

Subject

Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics

Link

https://www.scientific.net/SSP.80-81.237.pdf

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2. Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides;Theoretical Foundations of Chemical Engineering;2020-07

3. Optical emission spectroscopy of non-equilibrium microwave plasma torch sustained by focused radiation of gyrotron at 24 GHz;Journal of Physics D: Applied Physics;2020-05-28

4. Microcrystalline silicon thin films deposited by matrix-distributed electron cyclotron resonance plasma enhanced chemical vapor deposition using an SiF4 /H2chemistry;Journal of Physics D: Applied Physics;2016-06-21

5. Production of stable silicon and germanium isotopes via their enriched volatile compounds;Journal of Radioanalytical and Nuclear Chemistry;2015-05-26

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