The parameters of electron cyclotron resonance/radio-frequency hybrid hydrogen plasma adjusted by substrate arrangements
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3302534
Reference10 articles.
1. Comparison of advanced plasma sources for etching applications. III. Ion energy distribution functions for a helicon and a multipole electron cyclotron resonance source
2. Effect of radio-frequency bias voltage on the optical and structural properties of hydrogenated amorphous silicon carbide
3. The effects of substrate bias on plasma parameters in an electron cyclotron resonance plasma reactor
4. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
5. Control of plasma parameters in sheet‐shaped electron cyclotron resonance heating plasma supplemented with radio frequency discharge
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1. Comparative analysis of the plasma parameters of ECR and combined ECR + RF discharges in the TOMAS plasma facility;Plasma Physics and Controlled Fusion;2021-11-12
2. Multi-functional ECR plasma sputtering system for preparing amorphous carbon and Al–O–Si films;Surface and Coatings Technology;2011-12
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