Investigation of the gas pressure influence on patterned platinum etching characteristics using a high-density plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1330554
Reference21 articles.
1. Reactive ion Etching of Pt/PbZrxTi1−xO3/Pt Integrated Ferroelectric Capacitors
2. A reactive ion etch study for producing patterned platinum structures
3. Insight into the dry etching of fence-free patterned platinum structures
4. Effects of argon addition to a platinum dry etch process
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