Insight into the dry etching of fence-free patterned platinum structures-Reference-Cited by-同舟云学术

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Insight into the dry etching of fence-free patterned platinum structures

Published:1997-05 Issue:3 Volume:15 Page:596-603
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Milkove K. R.,Wang C. X.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580690

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of waveguide fabrication processes in lithium-niobate-on-insulator platform;AIP Advances;2024-06-01

2. Investigation for Low-Rate Fenceless Al Etching Applied in Fabrication of Superconducting Circuits;IEEE Transactions on Applied Superconductivity;2020-10

3. Simulation of redeposition during platinum etching in argon plasmas;Journal of Applied Physics;2010-03-15

4. Dry Etching of Pb(Zr,Ti)O3 Capacitor Module with TiN Hard Mask 쟧n O2/Cl2 Plasma;Journal of the Korean Physical Society;2009-08-14

5. Influence of redeposition on the plasma etching dynamics;Journal of Applied Physics;2007-04-15

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