Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion sourcea)
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1145233
Reference13 articles.
1. Measurement of negative‐ion‐production efficiencies and development of a dc operation sputter‐type negative ion source
2. A versatile high intensity plasma sputter heavy negative ion source
3. Further evaluation of the high intensity plasma sputter heavy negative ion source
4. Negative ion beam technology for materials science (invited)
5. Negative‐ion source for implantation and surface interaction of negative‐ion beams (invited)
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Extraction of molecular negative-ion beams of CN from radio frequency plasma-sputter-type heavy negative ion source for negative-ion beam deposition;Review of Scientific Instruments;1998-02
2. Negative‐ion extraction of gaseous materials from a radio frequency plasma‐sputter‐type heavy negative‐ion source;Review of Scientific Instruments;1996-03
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