Kinetics of oxidation on hydrogen-terminated Si(100) and (111) surfaces stored in air

Author:

Miura Taka-aki,Niwano Michio,Shoji Daisei,Miyamoto Nobuo

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference17 articles.

1. Chemical and electronic structure of the SiO2/Si interface

2. Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy

3. Formation of SiH bonds on the surface of microcrystalline silicon covered with SiOx by HF treatment

4. Unusually Low Surface-Recombination Velocity on Silicon and Germanium Surfaces

5. Chemical Surface preparation, Passivation and Cleaning for Semiconductor Growth and Processing, edited by R. J. Nemanich, C. R. Helms, M. Hirose, and G. Rubloff, Material Research Society Symposium Proceedings, Vol. 259 (Materials Research Society, Pittsburgh, PA, 1992).

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