Diagnostics of surface wave excited Kr/O2 plasma for low-temperature oxidation processes
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2752549
Reference20 articles.
1. The etching of polymers in oxygen‐based plasmas: A parametric study
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3. Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams
4. Single Crystalline Si Metal/Oxide/Semiconductor Field-Effect Transistors Using High-Quality GateSiO2Deposited at300°Cby Remote Plasma Technique
5. Oxide growth on silicon (100) in the plasma phase of dry oxygen using an electron cyclotron resonance source
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