Effects of plasma and/or 193 nm excimer‐laser irradiation in chemical‐vapor deposition of boron films from B2H6+He
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.350499
Reference18 articles.
1. Epitaxial Growth with Light Irradiation
2. Photostimulated molecular layer epitaxy
3. Influence of atomic hydrogen on the growth reactions of amorphous boron films in a low‐pressure B2H6+He+H2plasma
4. Simultaneous growth of rhombohedral and amorphous boron films in a low pressure B2H6+H2+He plasma
5. Transition from amorphous to crystal growth of boron films in plasma‐enhanced chemical vapor deposition with B2H6+He
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