Kinetics and role of C, O, and OH in low-pressure nanocrystalline diamond growth
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.373104
Reference37 articles.
1. Growth of diamond films at low pressure using magneto-microwave plasma CVD
2. Comparison of (CH4O2)bH2 and COH2 plasmas for low temperature diamond film deposition by electron cyclotron resonance plasma-assisted chemical vapor deposition
3. Characterization of electron cyclotron resonance plasmas optimized for the deposition of polycrystalline diamond films
4. Mechanism for diamond growth from methyl radicals
5. Scaling laws for diamond chemical‐vapor deposition. I. Diamond surface chemistry
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3. Mechanism of high growth rate for diamond-like carbon films synthesized by helicon wave plasma chemical vapor deposition;Plasma Science and Technology;2018-01-04
4. Development of Vacuum Ultraviolet Emission Source Using a Cone-Shaped O2/He Hollow Cathode Discharge;Journal of Nanoscience and Nanotechnology;2017-11-01
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