Characterization of electron cyclotron resonance plasmas optimized for the deposition of polycrystalline diamond films-Reference-Cited by-同舟云学术

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Characterization of electron cyclotron resonance plasmas optimized for the deposition of polycrystalline diamond films

Published:1993-01 Issue:1 Volume:11 Page:103-114
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Youchison D. L.,Eddy C. R.,Sartwell B. D.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578275

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanocrystalline Diamond;Carbon-Based Nanofillers and Their Rubber Nanocomposites;2019

2. Plasma Deposition of Diamond at Low Pressures: A Review;IEEE Transactions on Plasma Science;2014-12

3. Control of plasma space potentials and chemical vapor deposition of nanocrystalline diamond films in surface-wave excited low-pressure plasmas;Journal of Applied Physics;2007-01-15

4. Local retarding field for ions towards a positively biased substrate in plasma and its application to soft ion-bombardment processing;Journal of Applied Physics;2007-01

5. Growth of carbon nanotubes by microwave plasma chemical vapor deposition using CH4 and CO2 gas mixture;Thin Solid Films;2002-12

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