Tantalum etching in fluorocarbon/oxygen rf glow discharges
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345313
Reference13 articles.
1. Selective interhalogen etching of tantalum compounds and other semiconductor materials
2. Plasma etching of refractory metals (W, Mo, Ta) and silicon in SF6 and SF6-O2. An analysis of the reaction products
3. Reactive Ion Etching of Tantalum Pentoxide
4. Performance of Ta‐Ta2O5‐Au metal‐insulator‐metal devices
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