Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4820354
Reference25 articles.
1. Progress in EUV lithography towards manufacturing from an exposure tool perspective
2. Lithography gets extreme
3. Insertion strategy for EUV lithography
4. Multilayer reflective coatings for extreme-ultraviolet lithography
5. Molybdenum–strontium multilayer mirrors for the 8–12-nm extreme-ultraviolet wavelength region
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