Detection of misfit dislocations at interface of strained Si/Si0.8Ge0.2 by electron-beam-induced current technique
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1734688
Reference20 articles.
1. Fabrication and analysis of deep submicron strained-Si n-MOSFET's
2. Hole mobility enhancements in strained Si/Si1−yGey p-type metal-oxide-semiconductor field-effect transistors grown on relaxed Si1−xGex (x
3. Anomalous strain relaxation in SiGe thin films and superlattices
4. Defects in epitaxial multilayers
5. Identification of a Mobility-Limiting Scattering Mechanism in Modulation-Doped Si/SiGe Heterostructures
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