Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3481428
Reference43 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
3. Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique
4. Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering
5. Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
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3. Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering;Materials;2023-09-20
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