Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications-Reference-Cited by-同舟云学术

Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications

Published:2011-04-15 Issue:8 Volume:109 Page:083112
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Faradzhev Nadir S.,Yakshinskiy Boris V.,Starodub Elena,Madey Theodore E.,Hill Shannon B.,Grantham Steven,Lucatorto Thomas B.,Yulin Sergiy,Vescovo Elio,Keister Jeffrey W.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3575319

Reference34 articles.

1. Towards high accuracy reflectometry for extreme-ultraviolet lithography

2. Extreme ultraviolet lithography: A review

3. EUV Lithography

4. Interaction of benzene with TiO2 surfaces: Relevance to contamination of extreme ultraviolet lithography mirror capping layers

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