Plasma‐enhanced growth, composition, and refractive index of silicon oxy‐nitride films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359072
Reference25 articles.
1. Plasma‐enhanced growth and composition of silicon oxynitride films
2. Effect of rf power on remote‐plasma deposited SiO2 films
3. Characterization of Silicon‐Oxynitride Films Deposited by Plasma‐Enhanced CVD
4. Plasma‐Deposited Silicon Oxynitride from Silane, Nitrogen, and Carbon Dioxide or Carbon Monoxide or Nitric Oxide
5. Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition
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