Characterizing macroscopic lateral distortion in nanoimprint lithography using moiré interferometry
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4941404
Reference31 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Imprint Lithography with 25-Nanometer Resolution
3. Mold-assisted nanolithography: A process for reliable pattern replication
4. Soft Lithography
5. Nanoimprint lithography: An old story in modern times? A review
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