Surface reactions in the chemical vapor deposition of tungsten using WF6and SiH4on Al, PtSi, and TiN
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345791
Reference10 articles.
1. Selective Low Pressure Chemical Vapor Deposition of Tungsten
2. A molecular beam study of the reaction of WF6 on Si(100)
3. Mechanism for chemical‐vapor deposition of tungsten on silicon from tungsten hexafluoride
4. Gas/surface reactions in the chemical vapor deposition of tungsten using WF6/SiH4 mixtures
5. Reactive sticking coefficients for silane and disilane on polycrystalline silicon
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