Epitaxial growth of TaN thin films on Si(100) and Si(111) using a TiN buffer layer
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1466522
Reference14 articles.
1. Ultralarge scale integrated metallization and interconnects
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3. Tantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
4. Effects of oxygen in TiNxon the diffusion of Cu in Cu/TiN/Al and Cu/TiNx/Si structures
5. Nanocrystallization of amorphous-Ta40Si14N46 diffusion barrier thin films
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