Electrical properties of TiO2films deposited by a reactive‐ionized cluster beam
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.343093
Reference12 articles.
1. Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phases
2. C-V characteristics of metal-titanium dioxide-silicon capacitors
3. Titanium-dioxide dielectric films prepared by vapor reaction
4. Electronic Properties of the Interface between Si and TiO2Deposited at Very Low Temperatures
5. A simple chemical vapour deposition method for depositing thin TiO2 films
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