Titanium-dioxide dielectric films prepared by vapor reaction-Reference-Cited by-同舟云学术

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Titanium-dioxide dielectric films prepared by vapor reaction

Published:1964 Issue:12 Volume:52 Page:1463-1465
ISSN:0018-9219
Container-title:Proceedings of the IEEE
language:
Short-container-title:Proc. IEEE

Author:

Feuersanger A.E.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx5/5/31067/01445360.pdf?arnumber=1445360

Cited by 40 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Titanium Dioxide Versatile Solid Crystalline: An Overview;Assorted Dimensional Reconfigurable Materials;2020-09-09

2. XPS depth profiling and leakage properties of anodized titania dielectrics and their application in high-density capacitors;Journal of Materials Science;2015-08-06

3. Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2;Chemical Vapor Deposition;2010-03

4. Deposition of TiO2 Films by Liquid Injection ALD using New Titanium 2,5-dimethylpyrrolyl Complexes;ECS Transactions;2009-09-25

5. Electrical characteristics of ZrN metallised metal-oxide-semiconductor and metal-insulator-metal devices;Journal of Materials Science: Materials in Electronics;2006-05

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