Deposition of TiO2 Films by Liquid Injection ALD using New Titanium 2,5-dimethylpyrrolyl Complexes
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Published:2009-09-25
Issue:8
Volume:25
Page:813-819
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ISSN:1938-5862
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Container-title:ECS Transactions
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language:
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Short-container-title:ECS Trans.
Author:
Davies Hywel,Jones Anthony,Black Kate,Bacsa John,Chalker Paul,Marshall Paul A.,Heys Peter N.,Afzaal Mohammad,O'Brien Paul
Abstract
The new titanium 2,5-dimethylpyrrolyl complexes [(2,5-Me2C4H2N)Ti(NMe2)3] and [(2,5-Me2C4H2N)Ti(OPri)3]2 have been used for the deposition of TiO2 films by liquid injection ALD. TiO2 films deposited at a substrate temperature of 250oC contained residual carbon at levels of 4.1 - 5.9 at.%
Publisher
The Electrochemical Society