Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control-Reference-Cited by-同舟云学术

Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

Published:2015-02-02 Issue:5 Volume:106 Page:051111
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Lee Won-Sup¹,Kim Taeseob¹,Choi Guk-Jong¹^ORCID,Lim Geon¹^ORCID,Joe Hang-Eun¹,Gang Myeong-Gu¹,Moon Hyungbae²,Kim Do-Hyung²,Min Byung-Kwon¹,Park Young-Pil²,Park No-Cheol¹

Affiliation:

1. School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749, South Korea

2. Center for Information Storage Device, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749, South Korea

Funder

National Research Foundation of Korea (NRF)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4907653

Reference16 articles.

1. Terabit-per-square-inch data storage with the atomic force microscope

2. "Dip-Pen" Nanolithography

3. Contact optical nanolithography using nanoscale C-shaped apertures

4. Flying plasmonic lens in the near field for high-speed nanolithography

5. Finitte-Difference Time-Domain Studies on Optical Transmission through Planar Nano-Apertures in a Metal Film

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