Deposition of indium antimonide films by metalorganic magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95999
Reference4 articles.
1. Oxidation of an aluminum magnetron sputtering target in Ar/O2mixtures
2. The influence of target oxidation and growth-related effects on the electrical properties of reactively sputtered films of tin-doped indium oxide
3. MO-CVD growth of InGaAs using Me3Ga, AsMe3, AsH3 and Me3In or Et3 in and analyses of adducts formed during the growth process
4. Structural and electrical characteristics of InSb thin films grown by rf sputtering
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