Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials-Reference-Cited by-同舟云学术

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Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials

Published:2011-11-28 Issue:22 Volume:99 Page:222110
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Zhao Larry,Pantouvaki Marianna,Croes Kristof,Tőkei Zsolt,Barbarin Yohan,Wilson Christopher J.,Baklanov Mikhail R.,Beyer Gerald P.,Claeys Cor

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3664405

Reference6 articles.

1. Simple model for time-dependent dielectric breakdown in inter- and intralevel low-k dielectrics

2. A time dependent dielectric breakdown model for field accelerated low-k breakdown due to copper ions

3. Direct observation of the 1/E dependence of time dependent dielectric breakdown in the presence of copper

4. A model for electric degradation of interconnect low-k dielectrics in microelectronic integrated circuits

5. Kinetics of copper drift in PECVD dielectrics

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