Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4807404
Reference36 articles.
1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?
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1. Surface passivation of crystalline silicon by intrinsic a-Si:H films deposited in remote low frequency inductively coupled plasma;Applied Surface Science;2019-09
2. Rapid and controllable a-Si:H-to-nc-Si:H transition induced by a high-density plasma route;Journal of Physics D: Applied Physics;2017-08-29
3. Radicals and ions controlling by adjusting the antenna-substrate distance in a-Si:H deposition using a planar ICP for c-Si surface passivation;Applied Surface Science;2017-02
4. Growth and properties of hydrogenated microcrystalline silicon thin films prepared by magnetron sputtering with different substrate temperatures;Rare Metals;2015-05-24
5. Low temperature magnetron sputtering deposition of hydrogenated microcrystalline silicon thin films without amorphous incubation layers on glass;Journal of Non-Crystalline Solids;2014-03
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