Influence of GeSi interfacial layer on Ge–Ge optical phonon mode in SiO2 films embedded with Ge nanocrystals
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3257379
Reference23 articles.
1. Resonance Raman scattering by optical phonons in unstrained germanium quantum dots
2. Raman scattering investigation of aGe/SiO2/Sinanocrystal system under hydrostatic pressure
3. Raman scattering from Ge nanostructures grown on Si substrates: Power and limitations
4. Optical and acoustic phonon modes in self-organized Ge quantum dot superlattices
5. Effects of hydrostatic pressure on Raman scattering in Ge quantum dots
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1. Influence of oxygen co-implantation on germanium out-diffusion and nanoclustering in SiO2/Si films;Thin Solid Films;2022-03
2. Control of germanium diffusion using low quantities of co-implanted silicon isotopes;Journal of Applied Physics;2020-09-28
3. Blocking germanium diffusion inside silicon dioxide using a co-implanted silicon barrier;Journal of Applied Physics;2018-04-28
4. Electronic states and phonon properties of GexSi1−x nanostructures;Annals of Physics;2015-07
5. Light absorption in Ge nanoclusters embedded in SiO2: comparison between magnetron sputtering and sol–gel synthesis;Applied Physics A;2013-11-23
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