The chemisorption and reaction of BCl3with Si(111)
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.352057
Reference14 articles.
1. Phosphorus‐Doped Polycrystalline Silicon via LPCVD: II . Surface Interactions of the Silane/Phosphine/Silicon System
2. High phosphorus doping of epitaxial silicon at low temperature and atmospheric pressure
3. An infrared dielectric function model for amorphous solids
4. Adsorption of boron on Si(111): Its effect on surface electronic states and reconstruction
5. Structure determination of the Si(111):B(√3×√3)R30° surface: Subsurface substitutional doping
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1. B-Doped δ-Layers and Nanowires from Area-Selective Deposition of BCl3 on Si(100);ACS Applied Materials & Interfaces;2021-08-18
2. Reaction of BCl3 with H- and Cl-terminated Si(1 0 0) as a pathway for selective, monolayer doping through wet chemistry;Applied Surface Science;2020-12
3. DFT study of boron trichloride adsorption on the surface of Al12N12 nanocluster;Molecular Physics;2017-02-16
4. Influence of dopant concentration and type of substrate on the local organization of low-pressure chemical vapour deposition in situ boron doped silicon films from silane and boron trichloride;Thin Solid Films;2004-01
5. Metastable chlorine ion kinetics in inductively coupled plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-09
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