Study of the effect of experimental conditions on atomic layer deposition of aluminum nitride films-Reference-Cited by-同舟云学术

Study of the effect of experimental conditions on atomic layer deposition of aluminum nitride films

Published:2023-07-09 Issue: Volume:55 Page:122-127
ISSN:2791-0210
Container-title:Highlights in Science, Engineering and Technology
language:
Short-container-title:HSET

Author:

Sun Yuandong,Ni Peijun,Zhang Lijun,Kang Jingjie,Wang Ruolan,Zhao Tianhao

Abstract

AlN is an extremely chemically stable material that can withstand high temperature impacts and can be used as a coating against high temperature oxidation. In this paper, AlN films were grown on Si (111) substrates using pulsed chemical vapor deposition with a metal-organic source and ammonia as precursors followed by high-temperature in situ annealing and material physical characterization. The effects of temperature and plasma source on the AlN films were investigated, and it was concluded that the higher the temperature, the higher the growth rate of the AlN films and the lower the oxidation level. The plasma source pulsed mode showed higher growth rate and stronger aluminum signal, but its oxidation level was also higher. The plasma source normally open mode has a more desirable nitrogen signal.

Publisher

Darcy & Roy Press Co. Ltd.

Reference18 articles.

1. LI Haifeng, WANG Xitang, FAN Liren, LEI Xinrong, YANG Zhihong. Research progress on high temperature oxidation resistance of spinel-type aluminum oxynitride materials [J]. Materials Guide, 2004, (Vol.s2): 21-25.

2. Zhang MJ, Liu F, Hou YF. Study on the high-temperature oxidation resistance behavior of nano-AlON and its agglomeration mechanism [J]. Machinery Management Development, 2009, (Vol.6). 5-8.

3. Jussila, H, Mattila, P., Oksanen, J, Perros, A., Riikonen, J, & Bosund, M., et al. Appl. Phys. Lett. 100, 071606 (2012): 58-65.

4. Hwang, J., Schaff, W. J., Green, B. M., Cha, H., & Eastman, L.F. Solid State Electronics, 48, 363 (2004): 25-30.

5. LI Weiyuan, ZHU Beibei, SUN Quanquan, LU Bo, YUAN Hang, CHEN Xiao, LAN Jie, XU Jianfeng. Study on the homogeneity of curved nanofilms based on electron beam evaporation deposition*[J]. Flight Control and Detection, 2019, (Vol.2): 18-20.