Resistive switching memory characteristics of Ge/GeO x nanowires and evidence of oxygen ion migration

Abstract

Abstract The resistive switching memory of Ge nanowires (NWs) in an IrO x /Al2O3/Ge NWs/SiO2/p-Si structure is investigated. Ge NWs with an average diameter of approximately 100 nm are grown by the vapor–liquid-solid technique. The core-shell structure of the Ge/GeO x NWs is confirmed by both scanning electron microscopy and high-resolution transmission electron microscopy. Defects in the Ge/GeO x NWs are observed by X-ray photoelectron spectroscopy. Broad photoluminescence spectra from 10 to 300 K are observed because of defects in the Ge/GeO x NWs, which are also useful for nanoscale resistive switching memory. The resistive switching mechanism in an IrO x /GeO x /W structure involves migration of oxygen ions under external bias, which is also confirmed by real-time observation of the surface of the device. The porous IrO x top electrode readily allows the evolved O2 gas to escape from the device. The annealed device has a low operating voltage (<4 V), low RESET current (approximately 22 μA), large resistance ratio (>103), long pulse read endurance of >105 cycles, and good data retention of >104 s. Its performance is better than that of the as-deposited device because the GeO x film in the annealed device contains more oxygen vacancies. Under SET operation, Ge/GeO x nanofilaments (or NWs) form in the GeO x film. The diameter of the conducting nanofilament is approximately 40 nm, which is calculated using a new method.