Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes-Reference-Cited by-同舟云学术

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Published:2015-05 Issue:5 Volume:85 Page:1326-1338
ISSN:1070-3632
Container-title:Russian Journal of General Chemistry
language:en
Short-container-title:Russ J Gen Chem

Author:

Koval N. N.,Ivanov Yu. F.,Lopatin I. V.,Akhmadeev Yu. H.,Shugurov V. V.,Krysina O. V.,Denisov V. V.

Publisher

Pleiades Publishing Ltd

Subject

General Chemistry

Link

http://link.springer.com/content/pdf/10.1134/S1070363215050485.pdf

Reference29 articles.

1. Borisov, D.P., Koval, N.N., and Shchanin, P.M., Izv. Vyssh. Uchebn. Zaved., Fiz., 1994, no. 3, pp. 115–120.

2. RF Patent no. 2116707, 27.07. 1998.

3. Borisov, D.P., Goncharenko, I.M., Koval, N.N., and Schanin, P.M., IEEE Trans. Plasma Sci., 1998, vol. 26, no. 6, pp. 1680–1684.

4. Shchanin, P.M., Koval, N.N., Goncharenko, I.M., and Grigor’ev, S.V., Fiz. Khim. Obrab. Mater., 2001, no. 3, pp. 16–19.

5. Shugurov, V.V., Proc. 9th Int. Conf. on Modification of Materials with Particle Beams and Plasma Flows, Tomsk, Russia, September 21–26, 2008, pp. 27–30.

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