1. Rakhlin, V.I., Mirskov, R.G., Podgorbunskaya, T.A., and Voronkov, M.G., N-Halohexamethyldisilazanes, Zh. Obshch. Khim., 2007, vol. 77, no. 9, pp. 1437–1444 [Russ. J. Gen. Chem. (Engl. transl.), 2007, vol. 77, no. 9, pp. 1512-1518].
2. Smirnova, T.P., Badalyan, A.M., Borisov, V.O., Bakhturova, L.F., Kaichev, V.V., Podgorbunskaya, T.A., and Rakhlin, V.I., Plasma-Chemical Deposition of SiCN Films from Volatile N-Bromohexamethyldisilazane, Neorg. Mater., 2008, vol. 44, no. 12, pp. 1453–1460 [Inorg. Mater. (Engl. transl.), 2008, vol. 44, no. 12, pp. 1312–1318].
3. Fainer, N.I., Kosinova, M.L., Rumyantsev, Yu.M., Maksimovskii, E.A., Kuznetsov, F.A., Kesler, V.G., Kirienko, V.V., Bao-Shan, H., and Cheng, L., Synthesis and Physicochemical Properties of Nanocrystalline Silicon Carbonitride Films Deposited by Microwave Plasma from Organoelement Compounds, Fiz. Khim. Stekla, 2005, vol. 31, no. 4, pp. 573–580 [Glass Phys. Chem. (Engl. transl.), 2005, vol. 31, no. 4, pp. 427–432].
4. Fainer, N.I., Kosinova, M.L., Rumyantsev, Yu.M., Maximovskii, E.A., and Kuznetsov, F.A., Thin Silicon Carbonitride Films Are Perspective Low-k Materials, J. Phys. Chem. Solids, 2008, vol. 69, nos. 2–3, pp. 661–668.
5. Rakhlin, V.I., Grigor’ev, S.V., Mirskov, R.G., Podgorbunskaya, T.A., Voronkov, M.G., and Gendin, D.V., Preparative Synthesis of N-Bromohexamethyldisilazane, Zh. Obshch. Khim., 2003, vol. 73, no. 12, pp. 2063–2064 [Russ. J. Gen. Chem. (Engl. transl.), 2003, vol. 73, no. 12, pp. 1952–1953].