Chemical vapor deposition and photoluminescent properties of polycrystalline AlN films-Reference-Cited by-同舟云学术

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Chemical vapor deposition and photoluminescent properties of polycrystalline AlN films

Published:2006-06 Issue:6 Volume:42 Page:627-631
ISSN:0020-1685
Container-title:Inorganic Materials
language:en
Short-container-title:Inorg Mater

Author:

Red’kin A. N.,Gruzintsev A. N.,Makovei Z. I.,Tatsii V. I.,Yakimov E. E.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1134/S0020168506060094.pdf

Reference9 articles.

1. Belyanin, A.F., Bouilov, L.L., Zhirnov, V.V., et al., Application of Aluminum Nitride Films for Electronic Devices, Diamond Relat. Mater., 1999, vol. 8, pp. 369–372.

2. Meinschen, J., Falk, F., Hobert, H., and Stafast, H., Deposition of SiC and AlN Thin Films by Laser Ablation, Appl. Surf. Sci., 1999, vol. 138/139, pp. 543–548.

3. Guo, Q.X., Yahata, K., Tanaka, T., et al., Low-Temperature Growth of Aluminum Nitride on Sapphire Substrates, J. Cryst. Growth, 2003, vol. 257, pp. 123–128.

4. Edgar, J.H., Liu, L., Liu, B., et al., Bulk AlN Crystal Growth: Self-Seeding and Seeding on 6H-SiC Substrates, J. Cryst. Growth, 2002, vol. 246, pp. 187–193.

5. Raghothamachar, B., Dudley, M., Rojo, J.C., et al., X-ray Characterization of Bulk AlN Single Crystals Grown by the Sublimation Technique, J. Cryst. Growth, 2003, vol. 250, pp. 244–250.

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1. Structure and Optical Properties of AlN Crystals Grown by Metal Nitride Vapor Phase Epitaxy with Different V/III Ratios;ACS Omega;2022-06-25

2. Characterization of highly textured piezoelectric AlN films obtained from aluminum and ammonium chloride by a simple vapor deposition process;Thin Solid Films;2019-08

3. Investigation of textured aluminum nitride films prepared by chemical vapor deposition;Russian Microelectronics;2017-01

4. Structural and optical properties of c-axis oriented aluminum nitride thin films prepared at low temperature by reactive radio-frequency magnetron sputtering;Thin Solid Films;2012-12

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