Structural and optical properties of c-axis oriented aluminum nitride thin films prepared at low temperature by reactive radio-frequency magnetron sputtering-Reference-Cited by-同舟云学术

Structural and optical properties of c-axis oriented aluminum nitride thin films prepared at low temperature by reactive radio-frequency magnetron sputtering

Published:2012-12 Issue: Volume:524 Page:328-333
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Galca Aurelian C.,Stan George E.,Trinca Liliana M.,Negrila C. Catalin,Nistor Leona C.

Funder

Romanian Ministry of Education, Research, Youth and Sport-National Authority for Scientific Research

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference52 articles.

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2. Semiconductor Materials;Berger,1997

3. Near band-edge transition in aluminum nitride thin films grown by metal organic chemical vapor deposition

4. AlN avalanche photodetectors

5. The thermal stability of AlN

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