Author:
Sulimov A. V.,Kutov D. C.,Grigoriev F. V.,Tikhonravov A. V.,Sulimov V. B.
Reference33 articles.
1. Some fundamentals of optical thin film growth;N. Kaiser,2003
2. H. A. Macleod, ‘‘Recent developments in deposition techniques for optical thin films and coatings,’’ in Optical Thin Films and Coatings: From Materials to Applications (Woodhead, Oxford, Cambridge, Philadelphia, New Delhi, 2013), pp. 3–25.
3. F. V. Grigoriev, A. V. Sulimov, E. V. Katkova, I.V. Kochikov, O. A. Kondakova, V. B. Sulimov, and A. V. Tikhonravov, ‘‘Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films,’’ J. Non. Cryst. Solids 448, 1–5 (2016).
4. A. V. Tikhonravov, I. V. Kochikov, T. V. Amotchkina, F. V. Grigoriev, O. A. Kondakova, and V. B. Sulimov, ‘‘High performance modeling of modern deposition processes for optical coating nanotechnology,’’ Numer. Methods Program. 13, 491–496 (2012).
5. J. Sarnthein, A. Pasquarello, and R. Car, ‘‘Model of vitreous SiO2 generated by an ab-initio molecular-dynamics quench from the melt,’’ Phys. Rev. B 52, 12690–12695 (1995).
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