Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films-Reference-Cited by-同舟云学术

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Full-atomistic nanoscale modeling of the ion beam sputtering deposition of SiO2 thin films

Published:2016-09 Issue: Volume:448 Page:1-5
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Grigoriev F.V.,Sulimov A.V.,Katkova E.V.,Kochikov I.V.,Kondakova O.A.,Sulimov V.B.,Tikhonravov A.V.

Funder

Russian Science Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Oprtical properties and structure of SiO2 films prepared by ion-beam sputtering;Tabata;Thin Solid Films,1996

2. High performance atomistic modeling of optical thin films deposited by energetic processes;Grigoriev;Int. J. High Perform. Comp. Appl.,2015

3. Molecular dynamics simulations of vitreous silica structures;Takada;J. Non-Cryst. Solids,2004

4. Cooling-rate effects in amorphous silica: a computer-simulation study;Vollmayr;Phys. Rev. B,1996

5. Static and dynamic properties of a viscous silica melt;Horbach;Phys. Rev. B,1999

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4. Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films;Nanomaterials;2022-09-19

5. High-Performance Large-Scale Atomistic Simulation of Thin Films Deposition;Lobachevskii Journal of Mathematics;2022-04

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