Effect of the inclination of a test object on the calibration of an SEM-Reference-Cited by-同舟云学术

Effect of the inclination of a test object on the calibration of an SEM

Published:2013-11 Issue:6 Volume:7 Page:1283-1288
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Novikov Yu. A.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451013130107.pdf

Reference25 articles.

1. International Technology Roadmap for Semiconductors, 2011 Ed., Metrology (2011).

2. M. T. Postek and A. E. Vladar, in Handbook of Silicon Semiconductor Metrology, Ed. by A. C. Diebold (Marcel Dekker, New York, Basel, 2001), pp. 295–333.

3. Yu. A. Novikov and A. V. Rakov, Russ. Microelectron 25, 368 (1996).

4. T. Hatsuzawa, K. Toyoda, and Y. Tanimura, Rev. Sci. Instrum 61, 975 (1990).

5. C. G. Frase, W. HasslerGrohne, G. Dai, H. Bosse, Yu. A. Novikov, and A. V. Rakov, Meas. Sci. Technol 18, 439 (2007).

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modern Scanning Electron Microscopy. 3. Electron Probe;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2024-02

2. Calibration of a scanning electron microscope from two coordinates;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2017-07

3. Backscattered electron imaging of microand nanostructures: 4. Structures with a trapezoidal profile and large side-wall inclination angles;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2016-01