Gas-dynamic and thermal processes in the synthesis of trichlorosilane by hydrogen reduction of silicon tetrachloride in a high-frequency discharge-Reference-Cited by-同舟云学术

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Gas-dynamic and thermal processes in the synthesis of trichlorosilane by hydrogen reduction of silicon tetrachloride in a high-frequency discharge

Published:2014-09 Issue:9 Volume:87 Page:1246-1250
ISSN:1070-4272
Container-title:Russian Journal of Applied Chemistry
language:en
Short-container-title:Russ J Appl Chem

Author:

Kornev R. A.,Shaposhnikov V. A.,Kuz’min A. M.

Publisher

Pleiades Publishing Ltd

Subject

General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1134/S1070427214090092.pdf

Reference15 articles.

1. US Patent 4309259 A, 1982.

2. RF Patent 350558, 2009.

3. US Patent US 4542004 A, 1985.

4. Lu, Z., and Zhang, W., Chinese J. Chem. Eng., 2014, vol. 22, no. 2, pp. 227–233.

5. Rusanov, V.D. and Fridman, A.A., Fizika khimicheski ak tivnoi plazmy (Physics of Chemically Active Plasma), Moscow.: Nauka, 1984.

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1. Siemens Reloaded: Chloride‐Assisted Selective Hydrodechlorination of SiCl ₄ to HSiCl ₃;ChemSusChem;2023-01-26

2. Gas-dynamic and thermal processes in a high-frequency induction plasma torch with tangential stabilization of the gas flow;Theoretical Foundations of Chemical Engineering;2017-09

3. Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge;Plasma Chemistry and Plasma Processing;2017-05-24

4. Catalytic effects of electrode material on the silicon tetrachloride hydrogenation in RF-arc-discharge;RSC Advances;2016

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