Gas-dynamic and thermal processes in a high-frequency induction plasma torch with tangential stabilization of the gas flow-Reference-Cited by-同舟云学术

Gas-dynamic and thermal processes in a high-frequency induction plasma torch with tangential stabilization of the gas flow

Published:2017-09 Issue:5 Volume:51 Page:736-741
ISSN:0040-5795
Container-title:Theoretical Foundations of Chemical Engineering
language:en
Short-container-title:Theor Found Chem Eng

Author:

Kornev R. A.,Shabarova L. V.,Shishkin A. I.

Publisher

Pleiades Publishing Ltd

Subject

General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1134/S0040579517050323.pdf

Reference16 articles.

1. Polak, L.S., Ovsyannikov, A.A., Slovetskii, D.I., and Vurzel’, F.B., Teoreticheskaya i prikladnaya plazmokhimiya (Theoretical and Applied Plasmochemistry), Moscow: Nauka, 1975.

2. Karengin, A.G., Plazmennye tekhnologii pererabotki veshchestv (Plasma Technologies of Substance Treatment), Tomsk: Izd. Tomsk. Politekh. Univ., 2008, part1.

3. Mazin, V.I., RF Patent 2233563, 2004.

4. Frolov, V., Matveev, I., Ivanov, D., Zverev, S., Ushin, B., and Petrov, G., Experimental investigations of the hybrid plasma torch with reverse vortex stabilization, Rom. J. Phys. 2011, vol. 56, suppl., p. 36.

5. Matveev, I., Matveyeva, S., and Zverev, S., Experimental investigations of the APT-60 high-pressure inductively coupled plasma system on different plasma gases, IEEE Trans. Plasma Sci., 2014, vol. 16, no. 12, part 2, p. 3851.

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