A study of the effect of oxygen on the intensity of erbium photoluminescence in amorphous SiOx:(H, Er) films formed by DC magnetron sputtering-Reference-Cited by-同舟云学术

A study of the effect of oxygen on the intensity of erbium photoluminescence in amorphous SiOx:(H, Er) films formed by DC magnetron sputtering

Published:2003-07 Issue:7 Volume:37 Page:825-831
ISSN:1063-7826
Container-title:Semiconductors
language:en
Short-container-title:Semiconductors

Author:

Undalov Yu. K.,Terukov E. I.,Gusev O. B.,Kudoyarova V. Kh.

Publisher

Pleiades Publishing Ltd

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1134/1.1592859.pdf

Reference20 articles.

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3. R. Sema, J. H. Shin, M. Lohmeier, et al., J. Appl. Phys. 79, 35 (1966).

4. A. Polman, J. S. Custer, E. Snoens, and G. N. van den Hoven, Appl. Phys. Lett. 62, 507 (1993).

5. V. Petrova-Koch, H. P. Zeinde, J. Herion, and W. Beyer, J. Non-Cryst. Solids 97–98, 807 (1997).

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