Optimizing the Position of a Rotating Substrate during Magnetron Deposition of Thickness-Uniform Coatings
-
Published:2019-01
Issue:1
Volume:62
Page:109-115
-
ISSN:0020-4412
-
Container-title:Instruments and Experimental Techniques
-
language:en
-
Short-container-title:Instrum Exp Tech
Author:
Rogov A. V.,Kapustin Yu. V.
Publisher
Pleiades Publishing Ltd
Reference7 articles.
1. Martynenko, Yu.V., Rogov, A.V., and Shul’ga, V.I., Tech. Phys., 2012, vol. 57, no. 4, p. 439. 2. Golosov, D., Melnikov, S., Zavadski, S., Kolos, V., and Okojie, J., Plasma Phys. Technol., 2016, vol. 3, no. 3, p. 100. 3. Pavlov, A.V. and Shchekotova, I.V., Kompressornoe Energ. Mashinostr., 2006, vol. 6, no. 4, p. 109. 4. Starkov, I.A., Nyapshaev, I.A., Starkov, A.S., Abolmasov, S.N., Abramov, A.S., Levitskiy, V.S., and Terukov, E.I., J. Vac. Sci. Technol. A, 2017, vol. 35, no. 6, p. 061301.
https://doi.org/10.1116/1.4991527 5. Rogov, A.V., Kapustin, Yu.V., and Martynenko, Yu.V., Tech. Phys., 2015, vol. 60, no. 2, p. 283.
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Control of the Process of Plasma Cleaning of Input Mirrors of Optical Diagnostics of ITER in Glow Discharge Controlled by Direct and Mid-Frequency Pulsed Direct Current;Plasma Physics Reports;2023-06 2. Angular distribution of titanium ions and neutrals in high-power
impulse magnetron sputtering discharges;Journal of Vacuum Science & Technology A;2023-04-25 3. Angular Distributions during Magnetron Sputtering of Polycrystalline Mg, Al, Si, Ti, Cr, Cu, Zn, Ge, Zr, Nb, Mo, Ag, In, Sn, W, Pt, Au, and Bi Targets;Instruments and Experimental Techniques;2020-09-23
|
|