Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering-Reference-Cited by-同舟云学术

Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering

Published:2017-11 Issue:6 Volume:35 Page:061301
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Starkov Ivan A.¹,Nyapshaev Ilya A.²,Starkov Alexander S.³,Abolmasov Sergey N.⁴,Abramov Alexey S.⁴,Levitskii Vladimir S.⁴,Terukov Evgeny I.²

Affiliation:

1. Nanotechnology Center, St. Petersburg Academic University, Khlopin st. 8/3, 194021 St. Petersburg, Russia

2. R&D Center TFTE LLC, Politekhnicheskaya st. 26, 194064 St. Petersburg, Russia and Ioffe Institute, Politekhnicheskaya st. 26, 194021 St. Petersburg, Russia

3. Department of Advanced Mathematics, ITMO University, Kronverksky pr. 49, 197101 St. Petersburg, Russia

4. R&D Center TFTE LLC, Politekhnicheskaya st. 26, 194064 St. Petersburg, Russia

Funder

Russian Foundation for Basic Research (RFBR)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4991527

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