1. Kuz’michev, A.I., Magnetronnye raspylitel’nye sistemy. Vvedenie v fiziku i tekhniku magnetronnogo raspyleniya (Magnetron sputtering systems. Introduction to physics and engineering of magnetron sputtering), Kiev: Avers, 2008, vol. 1.
2. Berlin, E.V. and Seidman, L.A., Ionno-plazmennye protsessy v tonkoplenochnoi tekhnologii (Ion-plasma processes in thin-film technology), Moscow: Tekhnosfera, 2010.
3. Koski, K., Holsa, J., and Juliet, P., Surf. Coat. Technol., 1999, vol. 115, p. 163.
4. Milde, F., Schulze, D., and Teschner, G., Proc. 44th Ann. Techn. Conf. of Vacuum Coaters, Philadelphia: USA, 2001, p. 375.
5. Carter, D., Walde, H., and Nauman, K., Thin Solid Films, 2011. doi:10.1016/j.tsf.201104.103.